Two-sided sphula fermi quantum computing device manufactured by ion implantation method

A quantum computing device is fabricated by forming a first resist pattern on a superconductor layer (410) defining a device region and a sensing region within the device region. The superconductor layer within the sensing region is removed, exposing a region of the first surface of the underlying s...

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Bibliographische Detailangaben

Hauptverfasser:	SADANA, DEVENDRA, BEADLE STEPHEN, HOLMES, STEVEN, LI NING, HART STEPHEN, GUMANN PATRYK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ELECTRICITY
Online-Zugang:	Volltext bestellen
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