Processing liquid supply apparatus and processing liquid supply method

The invention relates to a processing liquid supply device and a processing liquid supply method, and relates to a scheme for improving the selection ratio in a substrate processing process through processing liquid. The processing liquid supply unit adjusts the supply amount of silica, mixes the processing liquid substance, adjusts the concentration and temperature of the processing liquid based on the substrate processing conditions, and supplies the processing liquid to the substrate processing apparatus. The processing liquid is recovered by a processing liquid recycling unit spatially separated from the processing liquid supply unit, the moisture concentration and temperature of the processing liquid are adjusted, and then the regenerated processing liquid is supplied. 本发明是处理液供应装置以及处理液供应方法，涉及如下方案：为了改善通过处理液的基板处理工艺中选择比，处理液供应单元在调整二氧化硅的供应量的同时混合处理液物质并基于基板处理条件调节处理液的浓度和温度后向基板处理装置供应，通过与所述处理液供应单元空间上分离的处理液再循环单元回收处理液并调节处理液的水分浓度和温度后供应再生处理液。