Glue uniformizing system

The invention provides a photoresist uniformizing system, and relates to the technical field of photoetching processes. The glue uniformizing system comprises a light source, a projection fixture and a base, the light source is used for projecting light; the projection fixture is positioned below the light source; the base is positioned right below the projection fixture and is used for fixing and rotating the substrate by taking a central straight line as an axis; the projection after the light source irradiates the projection fixture is reflected on the upper surface of the base, the shape and size of the contour of the projection correspond to those of the substrate respectively, and the projection is used for positioning the substrate; the central straight line penetrates through the center of the base and is perpendicular to the upper surface of the base. According to the technical scheme, non-contact and rapid centering operation of the substrate can be achieved, and the technical problems that a clamp