Precursor capsule, container and method

The present disclosure relates to a precursor capsule that holds a precursor for use in a vapor deposition process. The precursor capsule includes a vapor permeable enclosure configured to define a precursor space and to allow the precursor in vapor form to exit the precursor capsule under vaporizing conditions. The present disclosure also relates to a precursor container, a vapor deposition apparatus and a method comprising a capsule according to the present disclosure. 本公开涉及保持用于气相沉积过程的前体的前体胶囊。前体胶囊包括蒸汽可渗透的外壳，外壳配置成限定前体空间，并允许蒸汽形式的前体在蒸发条件下离开前体胶囊。本公开还涉及包含根据本公开的胶囊的前体容器、气相沉积设备和方法。