Epitaxial tray for improving temperature uniformity of substrate

The invention discloses an epitaxial tray for improving temperature uniformity of a substrate, and belongs to the technical field of epitaxial growth. The epitaxial tray is cylindrical, the epitaxial tray comprises a first surface and a second surface which are parallel to each other and opposite to...

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Bibliographische Detailangaben
Hauptverfasser:	JI LEI, HU YEWEI, JIANG YUANYUAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	The invention discloses an epitaxial tray for improving temperature uniformity of a substrate, and belongs to the technical field of epitaxial growth. The epitaxial tray is cylindrical, the epitaxial tray comprises a first surface and a second surface which are parallel to each other and opposite to each other, the epitaxial tray is provided with a plurality of concentric substrate placing rings on the first surface, and each substrate placing ring comprises a plurality of circular grooves which are uniformly distributed in the circumferential direction of the epitaxial tray; the bottom face of the circular groove is provided with concentric annular supporting protrusions. A plurality of concentric adjusting rings are arranged on the second surface of the extension tray, each adjusting ring comprises circular adjusting grooves evenly distributed in the circumferential direction of the extension tray, the diameter of each circular adjusting groove is smaller than the inner diameter of the annular supporting pr