Local vacuum maintaining device of sample processing device

The present invention relates to a local vacuum holding device for a sample processing apparatus, and more particularly, to a local vacuum holding device for a sample processing apparatus, which can improve the efficiency of transporting charged particles to a sample by forming pores on a path irradiated to the sample in order to generate charged particles for observing or processing the sample. A local vacuum can be formed around a sample, scattering of charged particles and disappearance of secondary electrons and the like used for forming an image can be prevented, in order to form and strengthen the local vacuum, the effectiveness of the local vacuum can be improved through a double local vacuum maintaining structure, and in order to effectively maintain the vacuum, the efficiency of the local vacuum can be improved. And the gas suction pressure and the inert gas discharge pressure are properly adjusted. 本发明涉及一种样品处理装置的局部真空保持装置，更加详细地，涉及一种样品处理装置的局部真空保持装置，其为了观察或者加工样品而产生带电粒子，在向样品照射的路径上形成孔隙，从而可以提高向样品传输带电粒子的效率，