Broadband spectrum objective lens vertical axis chromatic aberration detection system and method and semiconductor equipment

The invention provides a broadband spectrum objective lens vertical axis chromatic aberration detection system and method and semiconductor equipment, and the system comprises a motion platform which is used for bearing a calibration sheet with a recognizable pattern on the surface; the illumination...

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Bibliographische Detailangaben
Hauptverfasser: ZHAO RUNCHUAN, AI LIFU, YAN LISONG, MA JUN, ZHANG YU, FANG BIN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a broadband spectrum objective lens vertical axis chromatic aberration detection system and method and semiconductor equipment, and the system comprises a motion platform which is used for bearing a calibration sheet with a recognizable pattern on the surface; the illumination module is used for generating a broadband light beam comprising a plurality of illumination lights with different wavelengths lambda m, extracting the illumination lights with different wavelengths lambda m in the broadband light beam respectively and enabling the illumination lights to be vertically incident to the calibration sheet; a focusing module; the imaging module is used for imaging the calibration sheet positioned on the focal plane of the wide-spectrum objective lens so as to obtain a clear image of a surface pattern of the calibration sheet; and the calculation unit is used for acquiring the pattern size of the pattern when the illumination light with different wavelengths lambda m forms a clear image