Film forming apparatus

The invention provides a film forming apparatus capable of forming a functional film on a substrate without reducing the performance of the functional film. Specifically, the film forming apparatus is provided with: a film forming chamber (7) for forming a thin film on a film forming surface side of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ONCHI TAKUYA, KOMORI TSUNENORI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a film forming apparatus capable of forming a functional film on a substrate without reducing the performance of the functional film. Specifically, the film forming apparatus is provided with: a film forming chamber (7) for forming a thin film on a film forming surface side of a base material (2) conveyed in a roll-to-roll manner; a guide member (8) that forms a conveyance path of the base material (2) by contacting the film formation surface side or the opposite side of the base material (2) to guide the conveyance direction of the base material (2); and a protective member bonding part (9a) which is located on the downstream side of the film forming chamber (7) in the conveying path of the base material (2), is arranged between the film forming chamber (7) and a guide member (8) which is firstly contacted with the film forming surface side of the base material (2), and bonds a flexible protective member (B) to the film forming surface side of the base material (2). 本发明提供一种成膜装置,其能够不降低功