Eliminating ring, chemical vapor deposition machine and method for placing eliminating ring on chemical vapor deposition machine

An exclusion ring for use in a processing chamber, such as a chemical vapor deposition chamber, to process a semiconductor substrate, a chemical vapor deposition station, and a method of placing the exclusion ring thereon. The exclusion ring includes a first alignment structure that mates with a second alignment structure on a stage on which the wafer is to be placed during processing of the wafer. The first alignment structure includes a guide surface that facilitates reception and positioning of the second alignment structure within the first alignment structure. A method of using the exclusion ring is also provided. 一种排除环、化学气相沉积机台及将于其上放置排除环的方法，排除环用在处理腔室，例如化学气相沉积腔室中以处理半导体基材。排除环包括第一对准结构，在晶圆的处理期间，第一对准结构与晶圆将放置的平台上的第二对准结构相配合。第一队准结构包含导引面，导引面促进第二对准结构在第一对准结构内的接收和定位。另提供排除环的使用方法。