Cluster tool for production value manufacturing of dur bridge quantum Josephson junction devices

A deposition system includes a deposition source and a scan stage disposed within a deposition path of the deposition source. The scan stage includes a support platform configured to support a wafer thereon and a mechanical actuator coupled to the support platform. The mechanical actuator is configu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BEADLE STEPHEN, HOLMES STEVEN, SADANA DEVENDRA, LI NING
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A deposition system includes a deposition source and a scan stage disposed within a deposition path of the deposition source. The scan stage includes a support platform configured to support a wafer thereon and a mechanical actuator coupled to the support platform. The mechanical actuator is configured to translate the support platform relative to the deposition source. The deposition system includes a proximity mask disposed within a deposition path of the deposition source between the deposition source and the scan stage, the proximity mask defining a slit. The deposition system includes a controller in communication with the scan stage, the controller configured to control the mechanical actuator to translate the wafer relative to the slit such that the deposition angle remains substantially constant. In operation, the access mask prevents deposition source material having a trajectory that is not aligned with the slit from contacting the wafer. 沉积系统包括沉积源和设置在沉积源的沉积路径内的扫描台。扫描台包括支撑平台和机械致动器,支撑平台配置成在其上支撑晶片,机械致