Electronic system and authentication method

The invention provides an electronic system with a defect identification function and an identification method of a photoresist pattern formed by a lithography process. The electronic system has a detection device and a processor associated with the detection device. The detection device acquires at...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GU WENYE, ZHU HONGQI, ZHANG HONGZHI, TU JIMIN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The invention provides an electronic system with a defect identification function and an identification method of a photoresist pattern formed by a lithography process. The electronic system has a detection device and a processor associated with the detection device. The detection device acquires at least one image of the sample, and a photoresist pattern is formed on the sample using a lithography process. The processor is configured to automatically apply a machine learning program implemented via one or more neural networks to identify at least one defect present in the photoresist pattern. 本公开提供一种具有缺陷鉴定功能的电子系统以及微影制程形成的光阻图案的鉴定方法。该电子系统具有一检测设备以及一处理器,该处理器与该检测设备相关联。该检测设备获取该样品的至少一影像,而一光阻图案使用一微影制程而形成在该样品上。该处理器经配置以自动应用经由一或多个神经网络所实施的机器学习程序,以识别存在于该光阻图案中的至少一个缺陷。