SELF-STOP POLISHING COMPOSITIONS AND METHODS

A chemical mechanical polishing composition for polishing a substrate having a silica material, comprising, consisting of, or consisting essentially of: a liquid carrier; cubic ceria abrasive particles dispersed in the liquid carrier; a self-stopping agent; and a cationic polymer. 用于抛光具有硅氧材料的基板的化学机械...

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Bibliographische Detailangaben
Hauptverfasser:	CHANG JU-YEON, BROSNAN SARAH, WANG JEFF, JOHNSON BRIAN, HAINS ALEXANDER W
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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Beschreibung
Zusammenfassung:	A chemical mechanical polishing composition for polishing a substrate having a silica material, comprising, consisting of, or consisting essentially of: a liquid carrier; cubic ceria abrasive particles dispersed in the liquid carrier; a self-stopping agent; and a cationic polymer. 用于抛光具有硅氧材料的基板的化学机械抛光组合物，其包含以下、由以下组成或基本上由以下组成：液体载剂；立方形铈土研磨剂颗粒，其分散于该液体载剂中；自停止剂；及阳离子聚合物。