SUBSTRATE PROCESSING LIQUID RECOVERY UNIT AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

The invention provides a substrate processing liquid recovery unit with improved cleaning efficiency and a substrate processing apparatus having the substrate processing liquid recovery unit. The substrate processing apparatus includes: a substrate supporting unit that supports a substrate; and a su...

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Hauptverfasser: MOON JONG-WON, CHOI YE-JIN, BANG BYUNG-SUN, KANG TAE-HO
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creator MOON JONG-WON
CHOI YE-JIN
BANG BYUNG-SUN
KANG TAE-HO
description The invention provides a substrate processing liquid recovery unit with improved cleaning efficiency and a substrate processing apparatus having the substrate processing liquid recovery unit. The substrate processing apparatus includes: a substrate supporting unit that supports a substrate; and a substrate processing liquid recovery unit surrounding the substrate supporting unit and recovering the substrate processing liquid ejected toward the substrate, and having a first recovery bin including: a first substrate discharging the substrate processing liquid to the outside through a first recovery line, and a second substrate discharging the substrate processing liquid through a second recovery line; the substrate supporting unit includes a third portion disposed on one side of the substrate supporting unit and a fourth portion disposed on the other side of the substrate supporting unit. A first sidewall extending upward from one end of the first substrate; a first upper plate extending obliquely upward from a
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subjects BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
title SUBSTRATE PROCESSING LIQUID RECOVERY UNIT AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME
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