SUBSTRATE PROCESSING LIQUID RECOVERY UNIT AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

The invention provides a substrate processing liquid recovery unit with improved cleaning efficiency and a substrate processing apparatus having the substrate processing liquid recovery unit. The substrate processing apparatus includes: a substrate supporting unit that supports a substrate; and a su...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MOON JONG-WON, CHOI YE-JIN, BANG BYUNG-SUN, KANG TAE-HO
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The invention provides a substrate processing liquid recovery unit with improved cleaning efficiency and a substrate processing apparatus having the substrate processing liquid recovery unit. The substrate processing apparatus includes: a substrate supporting unit that supports a substrate; and a substrate processing liquid recovery unit surrounding the substrate supporting unit and recovering the substrate processing liquid ejected toward the substrate, and having a first recovery bin including: a first substrate discharging the substrate processing liquid to the outside through a first recovery line, and a second substrate discharging the substrate processing liquid through a second recovery line; the substrate supporting unit includes a third portion disposed on one side of the substrate supporting unit and a fourth portion disposed on the other side of the substrate supporting unit. A first sidewall extending upward from one end of the first substrate; a first upper plate extending obliquely upward from a