Comprehensive cleaning device for adhesive substances on surface of monocrystalline silicon wafer and use method of comprehensive cleaning device

The invention discloses a comprehensive cleaning device for adhesive substances on the surface of a monocrystalline silicon wafer and a using method of the comprehensive cleaning device, and relates to the technical field of monocrystalline silicon wafers. The silicon wafer cleaning device comprises a cleaning box and a silicon wafer body, a cleaning mechanism used for cleaning the silicon wafer body is installed at the top of the cleaning box, a cleaning mechanism used for cleaning the surface of the silicon wafer body is installed in the cleaning box, and a fixing box is further installed in the cleaning box. The surface of a silicon wafer body can be better cleaned through the rotating and moving tracks of the cleaning mechanism and the cleaning disc, the follow-up cleaning workload is reduced, the silicon wafer body can be better clamped through the clamping mechanism, the device can clean the two faces of the silicon wafer body through the rotating mechanism, and the cleaning efficiency is improved. And