Semiconductor device

The present invention addresses the problem of preventing a change in the characteristics of a TFT caused by the capture of oxygen in an oxide semiconductor film by a metal electrode in a semiconductor device using an oxide semiconductor TFT. In order to solve the problem, the present invention adop...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HANADA AKIHIRO, KAITO TAKUO, WATAKABE HAJIME
Format: Patent
Sprache:chi ; eng
Schlagworte:
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