Alumina polishing solution and preparation method thereof

The invention relates to the technical field of polishing solutions, in particular to an aluminum oxide polishing solution and a preparation method thereof. The aluminum oxide polishing solution is prepared from the following raw materials: aluminum oxide micro powder, alpha-naphthol polyoxyethylene ether, polyhydric alcohol, sodium carboxylate, a defoaming agent and a pH (Potential of Hydrogen) regulator; wherein the pH regulator comprises a compound mixture of organic alkali and inorganic alkali. The preparation method of the aluminum oxide polishing solution comprises the following steps: adding carboxylic acid sodium salt into a solution prepared from polyol; then adding alumina micro powder; and then adding alpha naphthol polyoxyethylene ether and a defoaming agent. The aluminum oxide polishing solution disclosed by the invention is beneficial to obtaining a silicon carbide wafer with relatively good surface quality. 本发明涉及抛光液技术领域，具体而言，涉及氧化铝抛光液及其制备方法；氧化铝抛光液的制备原料包括：氧化铝微粉、α萘酚聚氧乙烯醚、多元醇、羧酸钠盐、消泡剂和pH调节剂；其中，pH调节