Monolithic wafer cleaning device

The invention provides a monolithic wafer cleaning device which comprises a bearing table and a spray head, the spray head is located above the bearing table and comprises a cleaning liquid supply unit, a cleaning liquid recovery unit and a containing cavity, a cleaning liquid supply hole is located...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LIU FENG, HUANG YUNWEN, LIU ERZHUANG, CAI BIN, LIU TAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention provides a monolithic wafer cleaning device which comprises a bearing table and a spray head, the spray head is located above the bearing table and comprises a cleaning liquid supply unit, a cleaning liquid recovery unit and a containing cavity, a cleaning liquid supply hole is located in the bottom face of the containing cavity, and a plurality of cleaning liquid recovery holes are located in the edge of the containing cavity and located on the outer side of the cleaning liquid supply hole. The surface width of the bearing table is smaller than the opening width of the containing cavity, the containing cavity contains a wafer, and a gap is formed between the wafer and the containing cavity to form a dipping space. According to the monolithic wafer cleaning device, the cleaning liquid is supplied through the cleaning liquid supply unit, the cleaning liquid is recovered through the cleaning liquid recovery unit, and the containing cavity is combined, so that the dipping space is formed between th