Variable-grid core particle arrangement optimization algorithm
The invention provides a variable-grid core particle arrangement optimization algorithm, which comprises the following steps of S1, establishing a rectangular coordinate system, and enabling an X axis and a Y axis of the rectangular coordinate system to be tangent to the edge of a wafer; s2, taking...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a variable-grid core particle arrangement optimization algorithm, which comprises the following steps of S1, establishing a rectangular coordinate system, and enabling an X axis and a Y axis of the rectangular coordinate system to be tangent to the edge of a wafer; s2, taking the origin of coordinates of the rectangular coordinate system as a starting point, and finding an optimal combination of offsets of the Die arrangement in the X direction and the Y direction by adopting a dichotomy, so that the number of the Dies divided on the wafer is maximum, and array arrangement of the Dies is obtained; s3, setting the X-direction offset and the Y-direction offset of a single exposure unit Shot according to the Die arrangement obtained in the S2, so that the number of Shots required for covering the wafer is minimum, and obtaining a Shot arrangement; according to the variable-grid core particle arrangement optimization algorithm provided by the invention, the calculation amount is far smaller |
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