Wafer cleaning device capable of easily removing crystal accumulation

The invention discloses a wafer cleaning device capable of easily removing crystal accumulation. The wafer cleaning device comprises a bearing table; the first wafer clamping assembly is used for clamping the edge of the wafer piece; the second wafer clamping assembly is used for clamping the edge of the wafer; the first driving part is used for driving the first wafer clamping assembly to be close to or far away from the wafer; the second driving part is used for driving the second wafer clamping assembly to be close to or far away from the wafer; and the cleaning assembly is arranged above the bearing table. Through the application of the wafer clamping device, the first wafer clamping assemblies and the second wafer clamping assemblies are sequentially and alternately matched to clamp the wafers, so that the contact positions of the wafers and the corresponding clamping assemblies can be separated, and the cleaning assemblies are used for re-cleaning the edges, so that the cleanliness of the edges of the w