Pressure control method and system, terminal and storage medium

The invention relates to the technical field of semiconductor processing equipment, in particular to a pressure control method and system, a terminal and a storage medium, and aims at solving the problems that in the prior art, pressure change is achieved by changing the number of electromagnetic valves, manpower waste is likely to be caused in repeated electromagnetic valve assembling and disassembling operation, and the working efficiency is high. According to the technical scheme, the pressure control algorithm comprises the following steps: acquiring a pressure test flow pre-executed for a current batch of to-be-tested products, and testing the to-be-tested products in the current batch of the to-be-tested products in the current batch of the to-be-tested products according to the pressure test flow, obtaining the current first test pressure of the to-be-tested product, and obtaining a first pressure difference required for jumping from the first test pressure to the second test pressure of the next step