Mask inspection apparatus and mask inspection method using same

The present invention relates to a mask inspection apparatus and a mask inspection method using the same. The mask inspection method includes: acquiring an image by capturing an image of a unit mask in which a plurality of openings are defined; setting a region adjacent to an edge of the unit mask in the image as an inspection region; comparing the gradation of an opening disposed in the inspection region with a reference gradation; and confirming defects of the unit mask according to the comparison result. 本发明涉及一种掩模检查装置及利用该掩模检查装置的掩模检查方法。掩模检查方法包括如下步骤：拍摄定义有多个开口部的单位掩模而获取图像；将所述图像中的与所述单位掩模的边缘相邻的区域设定为检查区域；对布置于所述检查区域的开口部的灰度与基准灰度进行比较；以及根据所述比较结果来确认所述单位掩模的缺陷。