BARC resin for narrow-distribution 193nm deep ultraviolet photoresist and preparation method of BARC resin

The invention is applicable to the technical field of macromolecules, and provides a preparation method of narrow-distribution BARC resin for 193nm deep ultraviolet photoresist, which comprises the following steps: dissolving a BARC resin monomer, carboxylated fullerene and an initiator in a solvent to obtain a monomer solution, heating at high temperature, carrying out free radical polymerization reaction to obtain a reaction solution, and cooling to obtain the BARC resin for the 193nm deep ultraviolet photoresist. And carrying out precipitation treatment on the cooled reaction liquid by using mixed solvents with different polarities, separating and drying to obtain the BARC resin for the photoresist. Carboxyl of carboxylated fullerene can react with hydroxyl of hydroxypropyl methacrylate and hydroxyl of p-hydroxystyrene, some chain transfer development can be reduced, a narrow-distribution polymer can be obtained, a hollow sphere net structure of fullerene can reduce light reflection, the light absorption p