SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

The invention provides a substrate processing apparatus and a substrate processing method, which can reduce the usage amount of a hydrophobizing agent and hydrophobize the whole substrate. The substrate processing apparatus includes a processing tank, a holding portion, an organic solvent supply portion, a liquid discharge port, a gas supply portion, and an exhaust port. The processing tank stores a water layer in which a substrate is impregnated. The holding part holds the substrate. The organic solvent supply unit supplies an organic solvent onto the water layer to form a liquid layer of the organic solvent. The liquid discharge port discharges the water layer from the bottom wall of the processing tank, so that the liquid layer of the organic solvent drops from a position above the substrate to a position below the substrate. The gas supply unit supplies a hydrophobizing agent gas to the liquid layer from above the processing tank while the liquid layer descends. The exhaust port is exposed from the side w