Apparatus for dry deposition of photoresist

Systems and techniques for dry deposition of extreme ultraviolet sensitive (EUV sensitive) photoresist layers are discussed. In some such systems, a process chamber may be provided that is characterized by a multi-plenum showerhead configured to receive a vaporized organometallic precursor in one plenum and a vaporized reverse reactant thereof in another plenum. The two vaporization reactants may be transported to a reaction space within the processing chamber and on a wafer support supporting the substrate. 讨论了用于极紫外线敏感(EUV敏感)光致抗蚀剂层的干式沉积的系统和技术。在一些这样的系统中，可以提供特征在于多充气部喷头的处理室，所述多充气部喷头被配置成在一个充气部中接收汽化有机金属前体以及在另一充气部中接收其汽化逆反应物。这两种汽化反应物可以被输送至在处理室内且在支撑该衬底的晶片支撑件上的反应空间。