Printing glass passivation process method
The invention discloses a printing glass passivation process method, which comprises the following steps of: 1) loading a silicon single crystal wafer in a printing area, covering the surface of the silicon single crystal wafer with a stainless steel printing plate, and positioning a central printin...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a printing glass passivation process method, which comprises the following steps of: 1) loading a silicon single crystal wafer in a printing area, covering the surface of the silicon single crystal wafer with a stainless steel printing plate, and positioning a central printing through groove of the stainless steel printing plate in the middle of the silicon single crystal wafer; (2) glass paste coating and blade coating are conducted, specifically, the glass paste is poured into a stainless steel printing plate, the glass paste is scraped into the groove of the silicon single crystal wafer through a scraper in the diagonal direction of the chip, the operation is repeated for 1-2 times to fill the groove, and the scraper is made of resin or stainless steel or Teflon or rubber or polyurethane; the method comprises the following steps of 1, glass paste coating, 2, silicon single crystal wafer coating, 3, glass paste drying, and silicon single crystal wafer drying on a hot plate, 4, boat l |
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