Metal-dielectric-metal super-surface SERS substrate and processing method thereof

The invention relates to a metal-dielectric-metal super-surface SERS (Surface Enhanced Raman Scattering) substrate and a processing method thereof. The SERS substrate comprises a first SiO2 base layer, a precious metal layer is arranged on the surface of the first SiO2 base layer, a second SiO2 base...

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Bibliographische Detailangaben
Hauptverfasser:	XUE MINGXI, CHEN ZHIBIN, QIN MENGZE, WANG ZHENGJUN, CHEN ZHAOYI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	The invention relates to a metal-dielectric-metal super-surface SERS (Surface Enhanced Raman Scattering) substrate and a processing method thereof. The SERS substrate comprises a first SiO2 base layer, a precious metal layer is arranged on the surface of the first SiO2 base layer, a second SiO2 base layer is arranged on the surface of the precious metal layer, a groove is formed in the surface of the side, close to the precious metal layer, of the second SiO2 base layer, and a plurality of precious metal lines are arranged on the bottom face of the groove. According to the processing method of the SERS substrate, the first SiO2 base layer with the precious metal layer and the second SiO2 base layer which is provided with the groove and provided with the precious metal lines periodically distributed at the bottom of the groove are prepared respectively, and then the first SiO2 base layer and the second SiO2 base layer are combined to obtain the final metal-dielectric-metal super-surface SERS substrate. By usin