Method for determining mark measurement sequence, stage apparatus and lithographic apparatus

The invention provides a method of determining a mark measurement sequence for an object comprising a plurality of marks, the method comprising: receiving position data for a plurality of marks to be measured; acquiring a boundary model of the positioning device for performing the marking measuremen...

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Bibliographische Detailangaben
Hauptverfasser:	JENSEN ERIK, DUMAN OZGUR, HERES, PAUL, J, HERRMANN RALPH MICHAEL, MATTAAR THOMAS AUGUSTUS, VAN DEN NIEUWELAAR, NORBERTUS, J., M, NAGY ISTVAN, GIJSBERTSEN ANJA, VAN GILS PETRUS FRANCISCUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	The invention provides a method of determining a mark measurement sequence for an object comprising a plurality of marks, the method comprising: receiving position data for a plurality of marks to be measured; acquiring a boundary model of the positioning device for performing the marking measurement sequence, and determining the marking measurement sequence based on the position data and the boundary model. 本发明提供了一种针对包括多个标记的物体确定标记测量序列的方法，该方法包括：·接收针对要测量的多个标记的位置数据；·获取用于执行标记测量序列的定位装置的边界模型，以及·基于位置数据和边界模型来确定标记测量序列。