APPARATUS FOR PROCESSING SUBSTRATE

An apparatus for processing a substrate includes a process chamber for processing a substrate, a buffer module accommodating a ring member to be transferred into the process chamber, and a load lock chamber having an internal space. The buffer module comprises a buffer chamber, the buffer chamber is provided with a buffer space, and the annular component is contained in the buffer space; a support frame; the supporting frame is used for supporting the annular component in the buffer space; and a driving member that moves the support frame. 本发明涉及一种用于处理基板的装置，该装置包括处理基板的工艺腔室、容纳待传输至工艺腔室中的环状构件的缓冲模块、以及具有内部空间的装载锁定腔室。缓冲模块包括缓冲腔室，缓冲腔室具有缓冲空间，环状构件容纳在该缓冲空间中；支承架；该支承架支承缓冲空间中的环状构件；以及移动支承架的驱动构件。