High-hardness cold-rolled electrotinning substrate and production method thereof

The invention discloses a high-hardness cold-rolled electroplated tin substrate and a production method thereof. The technical problems that an existing high-hardness cold-rolled electroplated tin substrate is large in hardness fluctuation, low in ductility and high in manufacturing cost are mainly solved. According to the technical scheme, the high-hardness cold-rolled electrotinning substrate comprises the following chemical components in percentage by weight: 0.055 to 0.075 percent of C, less than or equal to 0.02 percent of Si, 0.20 to 0.30 percent of Mn, less than or equal to 0.015 percent of P, less than or equal to 0.010 percent of S, 0.02 to 0.06 percent of Al, less than or equal to 0.0040 percent of N, 0.05 to 0.08 percent of Cr and the balance of Fe and other inevitable impurities. The hardness of the cold-rolled electroplated tin substrate with the thickness of 0.17-0.45 mm is 61-65 HR30Tm, and the wave height within 1 m in the rolling direction of the cold-rolled steel plate is smaller than or equ