Substrate processing device

The invention provides a substrate processing device, which is characterized by comprising a vacuum locking cabin group for accommodating a substrate; the vacuum locking cabin group is provided with one or a plurality of substrates; the process cabin group is used for processing the substrate; the t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LI HUI, YE WUMAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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