Substrate processing device

The invention provides a substrate processing device, which is characterized by comprising a vacuum locking cabin group for accommodating a substrate; the vacuum locking cabin group is provided with one or a plurality of substrates; the process cabin group is used for processing the substrate; the transmission cabin is positioned between the vacuum locking cabin group and the process cabin; the transmission cabin is provided with a first transmission mechanism and a second transmission mechanism; the first conveying mechanism and the second conveying mechanism are both used for loading the substrates in the vacuum locking cabin set and moving the substrates. The substrate processing device is used for continuously conveying the substrate when one conveying mechanism is damaged or is regularly maintained, so that production interruption is avoided, and the productivity is favorably improved. 本发明提供了一种基片处理装置，其特征在于，包括：真空锁定舱组，用于容纳基片；所述真空锁定舱组设有一个或若干个基片；工艺舱组，用于对所述基片加工处理；传输舱，位于所述真空锁定舱组和所述工艺舱之间；所述传输舱设有第一传输机构和第二传输机构；所述