Bipolar pulse cathode plasma electrodeposition ceramic coating method with low current density

The invention belongs to the field of metal material surface engineering, and relates to a low-current-density bipolar pulsed cathode plasma electrodeposition method for a ceramic coating. The method includes the steps that a power source is a bipolar pulse power source, a graphite plate serves as an anode, and valve metal or an alloy sample thereof is connected with a cathode; an electrolyte system is an organic matter/water dual mixed solution, or water-soluble polymers are added, or doping modification is carried out; the cathode voltage is 120-300V, the anode voltage is 0-300V higher (or lower) than that of the cathode, the duty ratio of the cathode to the anode is 5: 4-17: 1, the pulse number ratio of the cathode to the anode is 1: 1-99: 1, and the power frequency is 50-3000Hz, so that the ceramic coating can be prepared on the surface of the cathode. The method is in an atmospheric open reaction environment and is simple to operate; in the reaction process, the cathode current density is lower than 0.15