APPARATUS FOR INITIATED CHEMICAL VAPOR DEPOSITION

The invention discloses equipment for initiating chemical vapor deposition, which comprises a vacuum chamber, a gas inlet system arranged on one side of the vacuum chamber and used for allowing reaction gas to enter a reaction chamber, and a vacuum control system positioned on the other side of the vacuum chamber, and a sample table capable of horizontally rotating is mounted on a lower bottom cover of the vacuum chamber; the air inlet system comprises a monomer air source pipeline and an initiator air source pipeline, one end of the monomer air source pipeline is connected with a monomer source tank, the other end of the monomer air source pipeline extends into the vacuum chamber, one end of the initiator air source pipeline is connected with an initiator source tank, and the other end of the initiator air source pipeline extends into the vacuum chamber; the monomer source tank and the initiator source tank are respectively provided with a heating device; a circulating water cooler is mounted on the sample t