Reflective mask blank for extreme ultraviolet rays and method for manufacturing same

The invention provides a reflective mask blank for extreme ultraviolet rays, a method for manufacturing the same, and a photomask. The mask blank includes a substrate, a reflective film stacked on the substrate, and an absorbing film stacked on the reflective film. The reflective film includes at least one Mo/Si layer and at least one Ru/Si layer, the at least one Mo/Si layer includes a Mo layer and a Si layer, and the at least one Ru/Si layer includes a Ru layer and a Si layer. Interdiffusion between respective layers forming the reflective film is suppressed in a mask blank for extreme ultraviolet rays having the reflective film. Accordingly, the reflectivity of the blank mask is improved, and the reflectivity is prevented from being reduced due to use after manufacturing, thereby prolonging the lifetime of the photomask. 一种针对极紫外线的反射型空白掩模、其制造方法及光掩模。空白掩模包含衬底、堆叠于衬底上的反射膜以及堆叠于反射膜上的吸收膜。反射膜包含至少一个Mo/Si层和至少一个Ru/Si层，至少一个Mo/Si层包含Mo层和Si层，至少一个Ru/Si层包含Ru层和Si层。形成反射膜的相应层之间的相互扩散在具有反射膜的针对极紫外线的空白掩模中受到抑制。因此，改良空白掩模的反射率，且防止反射率由