Posture-adjustable cleaning device applied to substrate bearing table

The invention discloses a pose-adjustable cleaning device applied to a substrate bearing table. Comprising a mounting bracket erected above the surface of a substrate bearing table, a plurality of spherical pair mechanisms connected to the bottom surface of the mounting bracket, a plurality of mandrels inserted into the spherical pair mechanisms and performing synchronous spherical motion with the spherical pair mechanisms, and a fixed bracket connected to the tail ends of the mandrels, and the plurality of scrapers are arranged on the bottom surfaces of the fixed brackets and extend towards the substrate bearing table. Thus, when the spherical pair mechanism generates spherical motion, the mandrels drive the scrapers to generate synchronous spherical motion, and the poses of the scrapers are further changed, so that when the poses of the substrate bearing table are changed, the poses of the scrapers can be correspondingly adjusted along with the change of the poses of the substrate bearing table through the