Preparation method of superconducting array structure

The invention discloses a preparation method of a superconducting array structure. The preparation method comprises the following steps: coating a positive photoresist on a bridge used for preparing a superconducting array structure on a substrate material, and forming a sample with a positive photoresist masking layer through exposure and development; the bridge for preparing the superconducting array structure comprises a silicon substrate, a SiO2 layer, an Au layer and an Nb layer, wherein the Au layer and the Nb layer are located on the SiO2 layer and located in a superconducting array structure preparation area. The Au layer and the Nb layer are arranged on the SiO2 layer from bottom to top; evaporating an Al layer on the sample; removing the positive photoresist masking layer and the Al layer growing on the positive photoresist masking layer through a solvent stripping process, and cleaning the sample; performing reactive ion etching on the cleaned sample, and removing the Nb layer in the same area as t