Floating gate manufacturing method

The invention provides a floating gate manufacturing method, which comprises the following steps of: providing a substrate and forming a plurality of floating gates on the substrate; at least a first protection layer, an auxiliary layer and a second protection layer are sequentially deposited on the surface of the floating gate from bottom to top, and the first protection layer and the second protection layer can prevent the auxiliary layer from being oxidized; and removing the second protection layer and the affiliated layer at the non-to-be-processed region on the floating gate through a subsequent process, and partially or completely retaining the affiliated layer on the to-be-processed region. According to the method, TiN can be protected when TiN and other auxiliary layers undergo a high-temperature process, the auxiliary layers are not prone to granulation, and the uniformity and stability of a produced device are guaranteed. 本发明提供一种浮栅制作方法，提供衬底，衬底上形成有多个浮栅；浮栅表面从下到上至少依次淀积形成有第一保护层、附属层和第二保护层，其中第一保护层和第二保护层能够