Vacuum gauge protection system and semiconductor device

The invention provides a vacuum gauge protection system, which comprises RPS equipment, a backfill vacuum gauge, a control valve and a control module, and is characterized in that the RPS equipment is used for providing a plasma gas source for a reaction chamber; the backfill vacuum gauge is connected with the reaction chamber; the control valve is used for connecting or disconnecting the backfill vacuum gauge and the reaction chamber; the control module is connected with the RPS equipment and the control valve, the control module is used for controlling on and off of the RPS equipment and on and off of the control valve, and when the control module controls the RPS equipment to be opened, the control module controls the control valve to be closed; and when the control module controls the RPS equipment to be closed and the fluorine ion content is smaller than or equal to a preset threshold value, the control module controls the control valve to be opened so as to communicate the backfill vacuum gauge with the