Method and device for testing vacuum leak rate of MPCVD equipment and medium
The invention relates to a method, a device and a medium for testing the vacuum leak rate of MPCVD equipment, and the method comprises the following steps: before diamond grows in the MPCVD equipment, recording the growth starting time t1 of the diamond, testing a first infrared spectrum of the diam...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a method, a device and a medium for testing the vacuum leak rate of MPCVD equipment, and the method comprises the following steps: before diamond grows in the MPCVD equipment, recording the growth starting time t1 of the diamond, testing a first infrared spectrum of the diamond, and obtaining a first absorption coefficient of a characteristic peak of nitrogen in the first infrared spectrum; according to the first absorption coefficient, the nitrogen content Ns1 before diamond growth is obtained; after the diamond grows in the MPCVD equipment, recording the growth ending time t2 of the diamond, testing a second infrared spectrum of the diamond, and obtaining a second absorption coefficient of a characteristic peak of nitrogen in the second infrared spectrum; according to the second absorption coefficient, the nitrogen content Ns2 after diamond growth is obtained; according to the Ns1 and the Ns2, the atomic weight Ns of nitrogen mixed in the diamond growth process is calculated; and ca |
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