Titanium oxynitride film pressure sensor and manufacturing method thereof
The invention discloses a titanium oxynitride film pressure sensor and a manufacturing method thereof. The manufacturing method of the sensor comprises the steps that an insulating film, a strain resistor, a lead bonding pad and a protective layer are prepared on an elastic element in sequence, the...
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| creator | CHE YANXIAN LAN ZHENLI ZHOU GUOFANG HE FENG |
| description | The invention discloses a titanium oxynitride film pressure sensor and a manufacturing method thereof. The manufacturing method of the sensor comprises the steps that an insulating film, a strain resistor, a lead bonding pad and a protective layer are prepared on an elastic element in sequence, the strain resistor is prepared from a titanium oxynitride film, and the titanium oxynitride film is prepared by taking titanium nitride as a target material through a sputtering method. Compared with the conventional titanium oxynitride film pressure sensor, the prepared titanium oxynitride film pressure sensor has the advantages that the content uniformity proportion of each component in the titanium oxynitride film is small, the compactness is good, and the structure is stable, so that the titanium oxynitride film pressure sensor has better stability and reliability, the titanium oxynitride film pressure sensor is a novel thin film pressure sensor and is better in performance, high in use value and good in applicati |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN114088261A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN114088261A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN114088261A3</originalsourceid><addsrcrecordid>eNqNyrEKwjAQANAuDqL-w_kBglGRrlIUXZy6l9Bc7EFzCXcX0L938QOc3vKWzaMn80w1QX5_mEwoIESaExRB1SoIiqxZwHOA5LlGP1oV4hcktCkHsAkFc1w3i-hnxc3PVbO9XfvuvsOSB9TiR2S0oXs6d9q37eHsLsd_zhdbCjWY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Titanium oxynitride film pressure sensor and manufacturing method thereof</title><source>esp@cenet</source><creator>CHE YANXIAN ; LAN ZHENLI ; ZHOU GUOFANG ; HE FENG</creator><creatorcontrib>CHE YANXIAN ; LAN ZHENLI ; ZHOU GUOFANG ; HE FENG</creatorcontrib><description>The invention discloses a titanium oxynitride film pressure sensor and a manufacturing method thereof. The manufacturing method of the sensor comprises the steps that an insulating film, a strain resistor, a lead bonding pad and a protective layer are prepared on an elastic element in sequence, the strain resistor is prepared from a titanium oxynitride film, and the titanium oxynitride film is prepared by taking titanium nitride as a target material through a sputtering method. Compared with the conventional titanium oxynitride film pressure sensor, the prepared titanium oxynitride film pressure sensor has the advantages that the content uniformity proportion of each component in the titanium oxynitride film is small, the compactness is good, and the structure is stable, so that the titanium oxynitride film pressure sensor has better stability and reliability, the titanium oxynitride film pressure sensor is a novel thin film pressure sensor and is better in performance, high in use value and good in applicati</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MEASURING ; MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE ; METALLURGY ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TESTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220225&DB=EPODOC&CC=CN&NR=114088261A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220225&DB=EPODOC&CC=CN&NR=114088261A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHE YANXIAN</creatorcontrib><creatorcontrib>LAN ZHENLI</creatorcontrib><creatorcontrib>ZHOU GUOFANG</creatorcontrib><creatorcontrib>HE FENG</creatorcontrib><title>Titanium oxynitride film pressure sensor and manufacturing method thereof</title><description>The invention discloses a titanium oxynitride film pressure sensor and a manufacturing method thereof. The manufacturing method of the sensor comprises the steps that an insulating film, a strain resistor, a lead bonding pad and a protective layer are prepared on an elastic element in sequence, the strain resistor is prepared from a titanium oxynitride film, and the titanium oxynitride film is prepared by taking titanium nitride as a target material through a sputtering method. Compared with the conventional titanium oxynitride film pressure sensor, the prepared titanium oxynitride film pressure sensor has the advantages that the content uniformity proportion of each component in the titanium oxynitride film is small, the compactness is good, and the structure is stable, so that the titanium oxynitride film pressure sensor has better stability and reliability, the titanium oxynitride film pressure sensor is a novel thin film pressure sensor and is better in performance, high in use value and good in applicati</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MEASURING</subject><subject>MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwjAQANAuDqL-w_kBglGRrlIUXZy6l9Bc7EFzCXcX0L938QOc3vKWzaMn80w1QX5_mEwoIESaExRB1SoIiqxZwHOA5LlGP1oV4hcktCkHsAkFc1w3i-hnxc3PVbO9XfvuvsOSB9TiR2S0oXs6d9q37eHsLsd_zhdbCjWY</recordid><startdate>20220225</startdate><enddate>20220225</enddate><creator>CHE YANXIAN</creator><creator>LAN ZHENLI</creator><creator>ZHOU GUOFANG</creator><creator>HE FENG</creator><scope>EVB</scope></search><sort><creationdate>20220225</creationdate><title>Titanium oxynitride film pressure sensor and manufacturing method thereof</title><author>CHE YANXIAN ; LAN ZHENLI ; ZHOU GUOFANG ; HE FENG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN114088261A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MEASURING</topic><topic>MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>CHE YANXIAN</creatorcontrib><creatorcontrib>LAN ZHENLI</creatorcontrib><creatorcontrib>ZHOU GUOFANG</creatorcontrib><creatorcontrib>HE FENG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHE YANXIAN</au><au>LAN ZHENLI</au><au>ZHOU GUOFANG</au><au>HE FENG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Titanium oxynitride film pressure sensor and manufacturing method thereof</title><date>2022-02-25</date><risdate>2022</risdate><abstract>The invention discloses a titanium oxynitride film pressure sensor and a manufacturing method thereof. The manufacturing method of the sensor comprises the steps that an insulating film, a strain resistor, a lead bonding pad and a protective layer are prepared on an elastic element in sequence, the strain resistor is prepared from a titanium oxynitride film, and the titanium oxynitride film is prepared by taking titanium nitride as a target material through a sputtering method. Compared with the conventional titanium oxynitride film pressure sensor, the prepared titanium oxynitride film pressure sensor has the advantages that the content uniformity proportion of each component in the titanium oxynitride film is small, the compactness is good, and the structure is stable, so that the titanium oxynitride film pressure sensor has better stability and reliability, the titanium oxynitride film pressure sensor is a novel thin film pressure sensor and is better in performance, high in use value and good in applicati</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MEASURING MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING |
| title | Titanium oxynitride film pressure sensor and manufacturing method thereof |
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