Method for forming silver film

The invention relates to a method for forming a silver film. It is an object of the present disclosure to provide a method that allows uniformly forming a silver film by a solid electrolyte deposition. One aspect of this embodiment is a method for forming a silver film. The method includes the step:...

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1. Verfasser: IIZAKA HIROFUMI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to a method for forming a silver film. It is an object of the present disclosure to provide a method that allows uniformly forming a silver film by a solid electrolyte deposition. One aspect of this embodiment is a method for forming a silver film. The method includes the step: disposing an anode, a substrate as a cathode, and a separator such that the separator is positioned between the anode and the substrate and the separator is in contact with a surface of the substrate, the separator including an electrolytic solution that contains silver ions, and applying a voltage between the anode and the substrate to form a silver film on the substrate. The separator is a porous membrane without ion exchange functional group. The electrolytic solution contains organic sulfonic acid ions. The substrate contains a crystalline metal, and a silver film is formed on the crystalline metal. 本发明涉及银被膜的形成方法。本公开的目的是提供能够采用固相电析法均匀地形成银被膜的方法。本实施方式的一个方案是一种方法,其为形成银被膜的方法,包括:配置阳极、作为阴极的基材、和包含含有银离子的电解液的分隔体以使分隔体位于阳极