TEMPERATURE CONDITIONING SYSTEM
Disclosed herein is a passive flow induced vibration (FIV) reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system comprises: a conduit that provides a flow path for a liquid thro...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Disclosed herein is a passive flow induced vibration (FIV) reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system comprises: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that the compliance of the membrane reduces at least the low frequency FIVs in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit the extent of deflection of the membrane.
本文中披露了一种用于在温度调节系统中使用的无源式流致振动减小系统,即无源式FIV减小系统,所述温度调节系统控制光刻设备内的至少一个部件的温度。这种FIV减小系统包括:导管,所述导管提供用于穿过所述系统的液体的流动路径;与所述导管成流体连接的液体填充 |
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