Integrated circuit device and method for manufacturing same

The invention provides an integrated circuit. The integrated circuit device comprises: a substrate; a first fin-shaped activation region and a second fin-shaped activation region extending on a substrate in a first direction; a first gate line and a second gate line which are located on the substrat...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	CHUNG JAE-YUP
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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