SUBSTRATE PROCESSING METHOD, COMPUTER READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING APPARATUS

A substrate processing method, A computer readable storage medium and A substrate processing apparatus are provided which can achieve uniform developing treatment in the substrate surface. The substrate processing method includes performing first developing processing of moving a nozzle having one end surface and a discharge port opened at the end surface while making the end surface come into contact with a developer on a front surface of a substrate in a state in which the nozzle is disposed so that the end surface faces the front surface and the developer is discharged from the discharge port at a first flow rate while rotating the substrate; and after the first developing processing, performing second developing processing of discharging the developer from the discharge port at a second flow rate higher than the first flow rate in a state in which the end surface is in contact with the developer on the front surface at a position facing a center of the front surface of the substrate while rotating the sub