Array Of Vertical Transistors And Method Used In Forming An Array Of Vertical Transistors
Disclosed are an array of vertical transistors and a method used in forming an array of vertical transistors. The array of vertical transistors comprises spaced pillars of individual vertical transistors that individually comprise an upper source/drain region, a lower source/drain region, and a chan...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Disclosed are an array of vertical transistors and a method used in forming an array of vertical transistors. The array of vertical transistors comprises spaced pillars of individual vertical transistors that individually comprise an upper source/drain region, a lower source/drain region, and a channel region vertically there-between. The upper source/drain region comprises a conductor oxide material in individual of the pillars. The channel region comprises an oxide semiconductor material in the individual pillars. The lower source/drain region comprises a first conductive oxide material in the individual pillars atop and directly against a second conductive oxide material in the individual pillars. Horizontally-elongated and spaced conductor lines individually interconnect a respective multiple of the vertical transistors in a column direction. The conductor lines individually comprise the second conductive oxide material atop and directly against metal material. The first conductive oxide material, the sec |
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