Lithography apparatus and device manufacturing method

A fluid handling structure is configured to confine an immersion fluid in an area between the fluid handling structure and a support table in a lithographic apparatus. The fluid handling structure includes: a first liquid opening at a sidewall of the fluid handling structure through which an immersion fluid is supplied to an area; a second liquid opening at the opposite sidewall to remove the immersion fluid from the area; an extractor comprising a plurality of discrete openings; a series of first openings radially outward of the extractor; and a series of second openings radially outward of the series of first openings, wherein the extractor, the series of first openings and the series of second openings are oriented towards the substrate and/or the support table, a first group of the series of first and second openings is in fluid communication with a first chamber, and a second group of the series of first and second openings is in fluid communication with a second chamber. 一种流体处理结构，被配置为将浸没流体限制在光刻设备中的流体处理结