Low-cost chromium-silicon alloy target and preparation method thereof

The invention provides a preparation method of a chromium-silicon alloy target. The preparation method comprises the following steps that firstly, small-size chromium-silicon alloy targets are prepared through a powder sintering method; and secondly, the chromium-silicon alloy targets prepared in th...

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Bibliographische Detailangaben
Hauptverfasser: JIANG DANPING, FU FENGNIAN, DONG TINGYI, YU WENJUN, HAO HAIYING, LYU BAOGUO, HU HELONG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides a preparation method of a chromium-silicon alloy target. The preparation method comprises the following steps that firstly, small-size chromium-silicon alloy targets are prepared through a powder sintering method; and secondly, the chromium-silicon alloy targets prepared in the first step are spliced into a whole through sand blasting, nickel plating and high-temperature adhesive tape, and the whole is fixed to a back plate through brazing. The method can solve the problems that an existing powder sintering technology is high in cost, a spliced target material is poor in flatness, and welding flux enters a welding seam to cause contamination. 本发明提出一种铬硅合金靶的制备方法,其包括:第一步,用粉末烧结法制备小尺寸铬硅合金靶;第二步,将第一步制备的铬硅合金靶通过喷砂、镀镍,用高温胶带拼接成一块,钎焊固定在背板上。该方法能够解决现有粉末烧结技术成本高、拼接靶材平整度差、焊料进入焊缝产生污染的问题。