SEGMENTATION OF AN IMAGE OF A SEMICONDUCTOR SPECIMEN
There is provided a system and method of segmenting an image of a fabricated semiconductor specimen. The method includes: obtaining a first probability map corresponding to the image representative of at least a portion of the fabricated semiconductor specimen and indicative of predicted probabiliti...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | There is provided a system and method of segmenting an image of a fabricated semiconductor specimen. The method includes: obtaining a first probability map corresponding to the image representative of at least a portion of the fabricated semiconductor specimen and indicative of predicted probabilities of pixels in the image to correspond to one or more first structural elements presented in the image, obtaining a first label map informative of one or more segments representative of second structural elements and labels associated with the segments, performing simulation on the first label map to obtain a second probability map indicative of simulated probabilities of pixels in the first label map to correspond to the one or more segments, and generating a second label map based on the first probability map and the second probability map, the second label map being usable for segmentation of the image with enhanced repeatability.
提供了一种对所制造的半导体样本的图像进行分割的系统和方法。所述方法包括:获得对应于所述图像的第一概率图,所述第一概率图表示所制造的半导体样本的至少一部分并且指示所 |
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