Mask

A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction, and includes a first edge portion, a first center portion, and a first welded portion that are sequentially arran...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE KWAN-HEE, HONG SEUNG-JOO, KO JUN-HYEUK, LEE SANG-MIN, KIM EUI-GYU, KIM SE-IL
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction, and includes a first edge portion, a first center portion, and a first welded portion that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction, and includes a second welded portion, a second center portion, and a second edge portion that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion. 一种掩模包括第一掩模,所述第一掩模包括在第一方向上延伸的第一长边和在与所述第一方向交叉的第二方向上延伸的第一短边,并且所述第一掩模包括在所述第一方向上顺序布置的第一边缘部分、第一中心部分和第一焊接部分。所述掩模进一步包括第二掩模,所述第二掩模包括在所述第一方向上延伸的第二长边和在所述第二方向上延伸的第二短边,并且所述第二掩模包括在所述第一方向上顺序布置的第二焊接部分、第二中心部分和第二边缘部分。所述第一焊接部分与所述第二焊接部分接触。